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知識(shí)產(chǎn)權(quán)保護(hù)對(duì)中美貿(mào)易影響的理論與實(shí)證分析

發(fā)布時(shí)間:2018-08-04 15:47
【摘要】:改革開(kāi)放以來(lái),隨著中國(guó)經(jīng)濟(jì)總量的飛速增長(zhǎng),中國(guó)的對(duì)外貿(mào)易也蓬勃發(fā)展。其中,中美兩國(guó)互為對(duì)方最重要的貿(mào)易伙伴之一。隨著中美貿(mào)易額的激增和貿(mào)易結(jié)構(gòu)的變化,知識(shí)產(chǎn)權(quán)領(lǐng)域的爭(zhēng)端日益成為中美最主要的貿(mào)易爭(zhēng)端之一。美國(guó)作為世界上最發(fā)達(dá)的國(guó)家,擁有最先進(jìn)的技術(shù)和產(chǎn)品研發(fā)能力;而中國(guó)作為世界上最大的發(fā)展中國(guó)家,在技術(shù)研發(fā)上與美國(guó)還存在較大的差距。這也導(dǎo)致通過(guò)模仿、仿制和盜版成為了除通過(guò)正常渠道引進(jìn)技術(shù)之外的又一條捷徑。而美國(guó)為了維護(hù)其貿(mào)易利益、維持其技術(shù)壟斷優(yōu)勢(shì),不斷在知識(shí)產(chǎn)權(quán)保護(hù)問(wèn)題上對(duì)中國(guó)施壓。如何正確認(rèn)識(shí)和妥善應(yīng)對(duì)中美知識(shí)產(chǎn)權(quán)爭(zhēng)端,成為擺在中國(guó)政府和企業(yè)面前的一個(gè)重要而緊迫的問(wèn)題。 本文首先從技術(shù)差距影響國(guó)際貿(mào)易的理論入手,闡述技術(shù)先進(jìn)國(guó)家尋求保護(hù)本國(guó)知識(shí)產(chǎn)品產(chǎn)權(quán)的理論依據(jù),并對(duì)WTO條款里面有關(guān)知識(shí)產(chǎn)權(quán)保護(hù)的內(nèi)容進(jìn)行解釋分析。然后從美國(guó)的知識(shí)產(chǎn)權(quán)保護(hù)體系出發(fā),回顧中美知識(shí)產(chǎn)權(quán)爭(zhēng)端的過(guò)程,分析美國(guó)知識(shí)產(chǎn)權(quán)保護(hù)的新趨勢(shì)和新特點(diǎn),以及對(duì)中國(guó)企業(yè)造成的影響。接著分別通過(guò)理論分析和建立計(jì)量模型檢驗(yàn)知識(shí)產(chǎn)權(quán)保護(hù)對(duì)中美貿(mào)易的各種影響,探尋美國(guó)對(duì)華知識(shí)產(chǎn)權(quán)保護(hù)方面種種訴求的根源。最后通過(guò)分析過(guò)去中美知識(shí)產(chǎn)權(quán)爭(zhēng)端的典型案例、并借鑒日、韓兩國(guó)的知識(shí)產(chǎn)權(quán)保護(hù)戰(zhàn)略以及日、韓兩國(guó)與美國(guó)的知識(shí)產(chǎn)權(quán)爭(zhēng)端過(guò)程的經(jīng)驗(yàn)來(lái)提出中國(guó)政府和企業(yè)的應(yīng)對(duì)之策。
[Abstract]:Since the reform and opening up, with the rapid growth of China's total economic volume, China's foreign trade is booming. Among them, China and the United States are one of the other's most important trading partners. With the rapid growth of Sino-US trade volume and the change of trade structure, intellectual property disputes have become one of the most important trade disputes between China and the United States. As the most developed country in the world, the United States has the most advanced technology and product R & D capability, while China, as the largest developing country in the world, still has a big gap with the United States in technology research and development. This has also led to imitation, imitation and piracy as a shortcut to the introduction of technology through normal channels. In order to safeguard its trade interests and maintain its technological monopoly advantage, the United States has been exerting pressure on China on the protection of intellectual property rights. How to correctly understand and properly deal with the intellectual property disputes between China and the United States has become an important and urgent issue facing the Chinese government and enterprises. This paper begins with the theory that the technology gap affects international trade, expounds the theoretical basis of the technology advanced countries seeking to protect the property rights of their own intellectual products, and explains and analyzes the content of intellectual property protection in the WTO clause. Then, from the perspective of American intellectual property protection system, this paper reviews the process of intellectual property disputes between China and the United States, and analyzes the new trends and characteristics of American intellectual property rights protection, as well as the impact on Chinese enterprises. Then through the theoretical analysis and the establishment of econometric models to examine the impact of intellectual property rights protection on Sino-US trade, to explore the root causes of American intellectual property rights protection to China. Finally, by analyzing the typical cases of intellectual property disputes between China and the United States in the past, and drawing lessons from the intellectual property protection strategies of Japan, Korea and the United States, and the experiences of the process of intellectual property disputes between Japan and South Korea and the United States, the countermeasures of Chinese government and enterprises are put forward.
【學(xué)位授予單位】:福建師范大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2013
【分類(lèi)號(hào)】:F204;F752.7

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