【摘要】：從Total Pitch(TP)的理論含義與監(jiān)控原理出發(fā),通過對相同Device下Pitch量和TP測試Mark的更改,討論了X方向以及Y方向TP的變化。通過相同Lay out不同產(chǎn)品和相同產(chǎn)品不同Lay out的對比,發(fā)現(xiàn)TP并不隨著Pitch量的改變而變化,但設(shè)備扭曲度(Distortion)影響著TP的變化,由此TP也可稱為Distortion在實際生產(chǎn)中的簡化監(jiān)測點,并且得到TP從NG到OK變化的pitch量區(qū)間,這也為降低圖形在基板上的扭曲程度和優(yōu)化Mask設(shè)計提供了新思路。
[Abstract]:Based on the theoretical meaning and monitoring principle of Total Pitch (TP), the changes of X direction and Y direction TP are discussed by changing the Pitch quantity and TP test Mark under the same Device. By comparing different products of the same Lay out and different Lay out of the same product, it is found that the TP does not change with the change of the amount of Pitch, but the (Distortion) of the equipment twist affects the change of TP, so TP can also be called the simplified monitoring point of Distortion in actual production. The pitch range of TP from NG to OK is obtained, which provides a new way to reduce the distortion of graphics on the substrate and to optimize the Mask design.
【作者單位】： 成都京東方光電科技有限公司;
【分類號】：TN873.93

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