本文選題：毫米波/亞毫米波天線(xiàn) + 工業(yè)攝影測(cè)量　； 參考：《微波學(xué)報(bào)》2017年S1期

【摘要】：天線(xiàn)反射面精度是天線(xiàn)系統(tǒng)主要的技術(shù)性能指標(biāo),一般要求表面精度是天線(xiàn)工作波長(zhǎng)的1/16~1/32,而測(cè)量精度要達(dá)到表面精度的1/3~1/5。對(duì)于毫米波/亞毫米波天線(xiàn),傳統(tǒng)測(cè)量方法如經(jīng)緯儀測(cè)量等存在很多缺點(diǎn),本文提出一種新的測(cè)量技術(shù),利用工業(yè)攝影測(cè)量技術(shù)對(duì)毫米波/亞毫米波天線(xiàn)形面進(jìn)行測(cè)量,并進(jìn)行了高精度天線(xiàn)形面測(cè)量實(shí)踐,結(jié)果滿(mǎn)足要求。
[Abstract]:Antenna reflector accuracy is the main technical performance index of antenna system. Generally, the surface accuracy is 1 / 16 / 32 of the antenna working wavelength, and the measurement accuracy should reach 1 / 3 / 1 / 5 of the surface precision. For millimeter-wave / sub-millimeter-wave antenna, traditional measurement methods such as theodolite measurement have many disadvantages. In this paper, a new measuring technique is proposed to measure the shape of millimeter-wave / sub-millimeter-wave antenna using industrial photogrammetry. The practice of high precision antenna profile measurement is carried out, and the results meet the requirements.
【作者單位】： 鄭州辰維科技股份有限公司;華北水利水電大學(xué);
【分類(lèi)號(hào)】：TN822
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本文編號(hào)：2075564