【摘要】：采用陰極電弧離子鍍工藝在硬質(zhì)合金基體表面沉積TiAlSiN涂層,在箱式電阻爐內(nèi)對涂層進(jìn)行了高溫抗氧化實驗,分析了涂層高溫氧化后的表面形貌、斷口形貌以及組織成分,并將TiN、AlTiN涂層式樣的氧化行為進(jìn)行對比。結(jié)果表明:800℃時,TiN、AlTiN涂層均已受到不同程度的氧化破壞,TiN涂層已經(jīng)失效,TiAlSiN涂層的斷口組織均勻,連續(xù)性好。通過能譜分析,引入Si元素涂層表面氧化率低于TiN、AlTiN涂層,使得TiAlSiN涂層的抗氧化性能更好。同時,TiAlSiN涂層在1000℃開始發(fā)生氧化破壞,基體邊緣受損。
[Abstract]:TiAlSiN coating was deposited on the surface of cemented carbide by cathodic arc ion plating. The oxidation resistance of the coating at high temperature was carried out in a box resistance furnace. The surface morphology, fracture morphology and microstructure of the coating after high temperature oxidation were analyzed. The oxidation behavior of TiN,AlTiN coating was compared. The results show that the TiAlSiN coating has been destroyed by oxidation at 800 鈩，

本文編號：2227900