本文選題：表面粗糙度 + 哈氏合金��； 參考：《材料導(dǎo)報(bào)》2017年02期

【摘要】：采用環(huán)保型拋光液對離子束輔助沉積技術(shù)路線用哈氏合金HastelloyC-276基帶進(jìn)行了電化學(xué)拋光,獲得了典型的陽極極化曲線,并闡述了電化學(xué)拋光的機(jī)理。研究了影響電化學(xué)拋光的因素(電解液溫度、拋光時(shí)間、拋光極距)對基帶表面粗糙度的影響,優(yōu)化工藝參數(shù)獲得了表面粗糙度Ra5nm(5μm×5μm)的高質(zhì)量表面,滿足后續(xù)生長過渡層對哈氏合金基帶的要求。拋光液中的檸檬酸在50℃左右分解成絡(luò)合劑,可迅速沉淀金屬離子,提高表面的活性。
[Abstract]:A typical anodic polarization curve was obtained by electrochemical polishing with HastelloyC-276 base band of Hardlich alloy for ion beam assisted deposition with environmentally friendly polishing liquid, and the mechanism of electrochemical polishing was described. The influence of factors affecting electrochemical polishing (electrolyte temperature, polishing time, polishing distance) on the surface roughness of baseband was studied. The surface roughness of Ra5nm(5 渭 m 脳 5 渭 m was obtained by optimizing the process parameters. Meet the requirements of the following growth transition layer for the base band of Hardlich alloy. The citric acid in the polishing liquid can be decomposed into a complexing agent at about 50 鈩，

本文編號：1975010