電鍍電流密度對(duì)鋁錳合金鍍層耐蝕性的影響
本文選題:Al-Mn合金 + 熔鹽電鍍 ; 參考:《表面技術(shù)》2017年12期
【摘要】:目的提高鋼鐵材料的耐腐蝕性能。方法采用添加了質(zhì)量分?jǐn)?shù)1.0%MnCl2作為錳源的Al Cl3-NaCl-KCl熔鹽體系,在電流密度分別為13.3、26.7、48.0、50.0、55.6 m A/cm~2的條件下在Q235鋼表面進(jìn)行電鍍,測(cè)試了該熔鹽體系中電鍍過(guò)程的循環(huán)伏安曲線。采用X射線衍射儀(XRD)、電子能譜儀(EDS)與掃描電子顯微鏡(SEM)對(duì)鍍層表面與橫剖面進(jìn)行檢測(cè),并在1.0 mol/L NaCl溶液中,用電化學(xué)工作站對(duì)鍍層進(jìn)行了動(dòng)電位極化曲線測(cè)試。結(jié)果電鍍過(guò)程中Al與Mn存在共沉積現(xiàn)象,不同電鍍電流密度條件下得到的Al-Mn合金鍍層均為非晶態(tài),鍍層的剖面分析表明鍍層均勻、界線清晰,成分為Al與Mn兩種金屬。電流密度較小時(shí)鍍層平整光滑,達(dá)到48.0 m A/cm~2時(shí),鍍層中開(kāi)始有胞狀物質(zhì)形成,且隨電流密度的增大變得顯著。平衡電位、線性極化電阻與腐蝕電流密度均隨電鍍電流密度先增大后減小,并且在電流密度為48.0m A/cm~2時(shí)達(dá)到最小腐蝕電流密度與最大線性極化電阻。結(jié)論 Al-Mn合金鍍層為非晶態(tài),電鍍電流密度為48.0 m A/cm~2得到的鍍層在1.0 mol/L NaCl溶液中具有較好的耐腐蝕性。
[Abstract]:Objective to improve the corrosion resistance of iron and steel materials. Methods Al Cl3-NaCl-KCl molten salt system with mass fraction of 1.0%MnCl2 as manganese source was used for electroplating on the surface of Q235 steel under the condition of current density of 13. 3 ~ 26. 7% 48.0 ~ 50. 0 ~ 55.6m A/cm~2, respectively. The cyclic voltammetry curves of the electroplating process in the molten salt system were measured. The surface and cross section of the coating were measured by X-ray diffractometer (XRD), electron energy spectrometer (EDS) and scanning electron microscope (SEM). The electrochemistry workstation was used to measure the dynamic potential polarization curve of the coating in 1. 0 mol/L NaCl solution. Results there was codeposition of Al and mn in the electroplating process. The Al-Mn alloy coatings obtained under different electroplating current density were amorphous. The profile analysis showed that the coating was uniform, the boundary was clear, and the composition was Al and mn. When the current density is small, the coating is smooth and smooth, reaching 48.0 Ma / cm ~ 2, and the cellular substance begins to form in the coating, and becomes obvious with the increase of the current density. The equilibrium potential, linear polarization resistance and corrosion current density increase first and then decrease with the current density of electroplating, and reach the minimum corrosion current density and the maximum linear polarization resistance when the current density is 48.0 Ma / cm ~ 2. Conclusion the Al-Mn alloy coating is amorphous and the electroplating current density is 48.0 m A/cm~2. The coating has good corrosion resistance in 1.0 mol/L NaCl solution.
【作者單位】: 呂梁學(xué)院化學(xué)化工系;
【基金】:山西省高等學(xué)校大學(xué)生創(chuàng)新創(chuàng)業(yè)訓(xùn)練計(jì)劃項(xiàng)目(晉教高2017 3號(hào))~~
【分類號(hào)】:TQ153
【相似文獻(xiàn)】
相關(guān)期刊論文 前10條
1 陳國(guó)興;電鍍電流密度計(jì)使用探討[J];電鍍與環(huán)保;1995年03期
2 徐叔炎;電鍍電流密度自控儀的研制[J];電鍍與環(huán)保;1995年06期
3 ;電鍍電流密度自控儀[J];電鍍與涂飾;1996年02期
4 徐叔炎;新型電鍍電流密度測(cè)控儀表的應(yīng)用[J];電鍍與環(huán)保;1998年01期
5 劉憶;楊森;殷錦捷;韓輝;;低溫鍍鐵時(shí)電流密度對(duì)鍍層性能的影響[J];電鍍與涂飾;2008年02期
6 伍濤;潘秉鎖;田永常;;低溫鍍鐵電流密度對(duì)鍍層組織形貌、組構(gòu)與硬度的影響[J];材料保護(hù);2012年12期
7 徐叔炎;電鍍電流密度自控方式的探索[J];電鍍與環(huán)保;1996年02期
8 李貴賓;李秀軍;胡葆福;石曉東;;溫度和電流密度對(duì)高速鍍鉻鋼板性能的影響[J];電鍍與涂飾;2013年08期
9 龍直心;;小零件籃鍍中電流密度控制的方法[J];電鍍與環(huán)保;1989年02期
10 安寧;;電流密度對(duì)無(wú)刻蝕低溫鍍鐵性能的影響[J];電鍍與環(huán)保;2009年06期
相關(guān)會(huì)議論文 前2條
1 張鴻儒;唐麗蓉;韓峰;;提高鋅鍍層耐蝕性的研究[A];中國(guó)電子學(xué)會(huì)化學(xué)工藝專業(yè)委員會(huì)第五屆年會(huì)論文集[C];2000年
2 李華為;鐵梅;;低鐵鋅基合金鍍層耐蝕性探討[A];2004年全國(guó)電子電鍍學(xué)術(shù)研討會(huì)論文集[C];2004年
相關(guān)碩士學(xué)位論文 前3條
1 韓登峰;鎳與鋅鎳合金的電鍍及耐蝕性能研究[D];合肥工業(yè)大學(xué);2012年
2 劉榮;數(shù)控電噴鍍工藝試驗(yàn)研究[D];南京農(nóng)業(yè)大學(xué);2011年
3 黃明;熔鹽電鍍鋁鎳合金和鋁錳合金[D];山東理工大學(xué);2011年
,本文編號(hào):1807584
本文鏈接:http://www.sikaile.net/kejilunwen/huaxuehuagong/1807584.html