【摘要】：隨著個(gè)人電子設(shè)備朝多功能、微型化、輕薄化、系統(tǒng)高度集成化方向發(fā)展,高端個(gè)人電子產(chǎn)品,例如下一代智能手機(jī)、Pad、iPhone、數(shù)碼相機(jī)等,其制造商需要生產(chǎn)出功能強(qiáng)大、但更節(jié)能的產(chǎn)品。然而面向下一代高端個(gè)人電子產(chǎn)品的制造,最重要的技術(shù)當(dāng)屬印刷電路板(PCB)的光刻。傳統(tǒng)PCB光刻采用的是汞燈接近式的曝光技術(shù),成本高、其光刻精度低,對(duì)環(huán)境污染大。而數(shù)字光刻無論從成本,精度,亦或是生產(chǎn)效率和對(duì)環(huán)境的影響,都有著傳統(tǒng)PCB光刻無法比擬的優(yōu)勢(shì)。因此針對(duì)PCB制造進(jìn)行數(shù)字光刻相關(guān)技術(shù)研究具有非常重要的意義�；诔跫�(jí)像差理論本文設(shè)計(jì)了一組適合0.7XGA DMD的光刻投影物鏡,該投影物鏡組具有雙高斯對(duì)稱結(jié)構(gòu)。此結(jié)構(gòu)是最容易消除五種初級(jí)像差的初始結(jié)構(gòu)。由于只是滿足微米級(jí)PCB光刻的需要,該投影物鏡組放大率為-1,且不用非球面鏡即能讓物鏡達(dá)到13.68gm的精度。它總共由8片鏡片組成,前4片與后4片關(guān)于中心光闌對(duì)稱,因此在加工時(shí)只需加工4個(gè)透鏡的模具,這樣既可以降低成本,又有利于光刻系統(tǒng)中透鏡的裝配�；贒MD的工作方式進(jìn)行了數(shù)字光刻掃描技術(shù)研究,提出傾斜掃描的技術(shù),它的優(yōu)勢(shì)是消除了DMD的柵格效應(yīng),提高了成像質(zhì)量。結(jié)合所設(shè)計(jì)投影物鏡組它既能實(shí)現(xiàn)整數(shù)倍像素以外的線寬,又能提高圖像的分辨率。在DMD傾斜掃描模式下進(jìn)行了光刻實(shí)驗(yàn),取得了良好的實(shí)驗(yàn)結(jié)果,實(shí)現(xiàn)了非整數(shù)線寬,和其他方法用于該精度的曝光情形相比,像面照度均勻,線條清晰,邊緣陡峭且線性度好,因而能很好地滿足光刻的需要。數(shù)字無掩模光刻掩模圖形的生成在實(shí)際應(yīng)用中較為復(fù)雜,例如如何識(shí)別線矢量圖形,將線矢量圖形轉(zhuǎn)換為適合每一個(gè)微鏡的格柵圖形,發(fā)送這些格柵圖形到DMD控制器,便于微鏡反射開／關(guān)的執(zhí)行等,因此我們進(jìn)行了數(shù)字光刻動(dòng)態(tài)圖形控制技術(shù)研究。提出一種基于區(qū)域的數(shù)字光刻掩模圖形生成方法,介紹了該方法的設(shè)計(jì)思想和設(shè)計(jì)流程,并對(duì)該動(dòng)態(tài)圖形控制技術(shù)進(jìn)行了比較分析,討論了該技術(shù)的可行性。
[Abstract]:As personal electronics move towards multifunction, miniaturization, thinning, and systems integration, high-end personal electronics, such as next-generation smartphones, Pad,iPhone, digital cameras, and so on, require manufacturers to produce powerful capabilities. But more energy efficient products. However, for the next generation of high-end personal electronics manufacturing, the most important technology is printed circuit board (PCB) lithography. The traditional PCB lithography is based on mercury lamp exposure technology, which has the advantages of high cost, low lithography accuracy and great environmental pollution. Digital lithography has many advantages over traditional PCB lithography in terms of cost, precision, production efficiency and environmental impact. Therefore, it is of great significance to study the digital lithography technology for PCB manufacturing. Based on the primary aberration theory, a set of photolithographic objective lenses suitable for 0.7XGA DMD is designed in this paper, which has a double Gao Si symmetry structure. This structure is the most easy to eliminate five primary aberrations of the initial structure. Because it only meets the need of micron PCB lithography, the magnification of the projective objective group is -1, and the objective lens can achieve the accuracy of 13.68gm without non-spherical lens. It consists of a total of 8 lenses. The first four pieces are symmetrical with the latter four pieces about the central aperture. Therefore, only four lens molds need to be machined, which can not only reduce the cost but also facilitate the assembly of the lenses in the lithography system. Based on the working mode of DMD, the digital lithography scanning technology is studied, and the tilted scanning technique is proposed. Its advantage is to eliminate the grid effect of DMD and improve the imaging quality. Combined with the designed projection objective group, it can not only realize the linewidth beyond integer pixels, but also improve the resolution of the image. The experiments of lithography in DMD tilt scanning mode are carried out, and good experimental results are obtained, and the non-integer linewidth is realized. Compared with other methods, the image plane illumination is uniform, the lines are clear, the edges are steep and the linearity is good. So it can satisfy the need of lithography. The generation of digital mask patterns is more complicated in practical applications. For example, how to recognize line vector graphics, convert line vector graphics into grid graphics suitable for each micromirror, and send these grid graphics to DMD controller. It is convenient to perform on / off of micromirror reflection, so we study the dynamic graphic control technology of digital lithography. A method of generating digital lithography mask graphics based on region is proposed. The design idea and design flow of this method are introduced. The dynamic graphic control technology is compared and analyzed, and the feasibility of this technique is discussed.
【學(xué)位授予單位】：廣東工業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN41;TN305.7

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