發(fā)布時間：2018-05-20 23:35

  本文選題：非對稱金屬包覆介質波導 + 表面等離子體�。� 參考：《蘭州理工大學》2017年碩士論文

【摘要】：本文基于非對稱金屬包覆介質波導,使用棱鏡激發(fā)該結構中的導模,刻寫一維亞波長光柵和二維多層亞波長光子結構。通過分析導模的色散曲線和導模干涉光場分布圖,研究一維亞波長光柵和二維多層亞波長光子結構的周期與相關參數的關系。該制備方法成本低廉,操作簡單,產出高,為這兩種微納結構的廣泛利用提供了重要的理論參考,并且為以后在實驗中刻寫制備多層亞波長光子結構提供了一種可能的方法。具體研究內容如下:(1)用325nm波長的激光激發(fā)由Al膜,光刻膠,和空氣組成的非對稱金屬包覆介質波導結構中的零階導模,來刻寫不同周期,不同深寬比的亞波長光柵。通過零階導模色散曲線理論分析和有限元方法數值模擬,發(fā)現改變光刻膠的厚度和折射率,導模的偏振可以刻寫不同周期和不同深寬比的亞波長光柵,并且刻寫的亞波長光柵最小周期能夠達90nm。(2)基于非對稱金屬包覆介質波導,利用棱鏡耦合方式激發(fā)該結構中的TE0導模,通過兩束TE0導模干涉,從而在理論上實現刻寫周期可調的亞波長光柵。在研究中,我們用TE0導模的色散曲線,研究了TE0導模刻寫的亞波長光柵周期與激發(fā)光波長、光刻膠厚度和折射率、棱鏡之間的關系。再用有限元方法模擬的非對稱金屬包覆介質波導中TE0導波模式的干涉電場分布進行驗證。最后,將TE0導模干涉光刻與表面等離子體干涉光刻進行比較,發(fā)現由于TE0導模穿透深度相較于SPP更大,故而可實現在厚光刻膠條件下,改變激發(fā)光波長、棱鏡折射率、光刻膠折射率、尤其是光刻膠厚度等方法有效調控亞波長光柵的周期。(3)理論研究高階導模干涉刻寫不同周期和層數的多層亞波長光子結構。442nm波長的激光作為激發(fā)光源激發(fā)非對稱金屬介質波導中的高階導模。理論分析導模的色散曲線和數值模擬的導模干涉場分布,詳細研究多層亞波長光子結構的周期與光刻膠的厚度和折射率,高階導模的模序數和偏振的關系。這種制備方法不僅可以制備不同周期和層數的多層亞波長光子結構,而且它的過程簡單,成本低廉。
[Abstract]:Based on the asymmetric metal-coated dielectric waveguide, the guided mode of the structure is excited by prism, and the 2-D multilayer subwavelength photonic structure is described. By analyzing the dispersion curve of the guided mode and the light field distribution of the guided mode interference, the relationship between the periodicity and the related parameters of the 1-B wavelength grating and the two-dimensional multilayer sub-wavelength photonic structure is studied. This method has the advantages of low cost, simple operation and high output, which provides an important theoretical reference for the wide use of these two microstructures, and provides a possible method for the fabrication of multilayer sub-wavelength photonic structures in the future. The specific research contents are as follows: (1) the zero-order guided mode in the asymmetric metal-coated dielectric waveguide structure composed of Al film, photoresist and air is excited by 325nm wavelength laser to write subwavelength gratings with different periods and different aspect ratios. By theoretical analysis of zero-order guided mode dispersion curve and numerical simulation by finite element method, it is found that by changing the thickness and refractive index of photoresist, the polarization of guided mode can be characterized by subwavelength grating with different periods and ratio of depth to width. And the minimum period of the subwavelength grating can be up to 90nm.m-2) based on the asymmetric metal-coated dielectric waveguide, the TE0 guided mode in the structure is excited by prism coupling mode, and the interference is achieved by two TE0 guided mode interference. Thus the subwavelength grating with adjustable writing period can be realized theoretically. In the study, we use the dispersion curve of TE0 guided mode to study the relationship between the period of subwavelength grating and the wavelength of excited light, thickness of photoresist and refractive index, prism. The interference electric field distribution of TE0 guided wave mode in asymmetric metal-clad dielectric waveguide was simulated by finite element method. Finally, by comparing the TE0 guided mode interference lithography with the surface plasma interference lithography, it is found that because the penetration depth of the TE0 guide mode is larger than that of the SPP, it can be realized under the condition of thick photoresist to change the excited light wavelength and the refractive index of the prism. Refractive index of photoresist, Theoretical study on the effective Control of the period of Subwavelength grating by photoresist thickness) theoretical study of higher-order guided mode interferometry with different periods and layers of multi-layer sub-wavelength photonic structure. 442 nm wavelength as excitation source to excite asymmetric light High order guided modes in metallic dielectric waveguides. The dispersion curve of guided mode and the distribution of guided mode interference field in numerical simulation are analyzed theoretically. The relationship between the period of multilayer sub-wavelength photonic structure and the thickness and refractive index of photoresist, the mode number and polarization of high-order guided mode is studied in detail. This method can not only fabricate multilayer sub-wavelength photons with different periods and layers, but also have simple process and low cost.
【學位授予單位】：蘭州理工大學
【學位級別】：碩士
【學位授予年份】：2017
【分類號】：TN25

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