本文選題：飛秒激光　切入點(diǎn)：玻璃材料缺陷修復(fù)　出處：《北京理工大學(xué)》2015年碩士論文

【摘要】：離子注入具有參數(shù)高度可控的特點(diǎn),被廣泛應(yīng)用于光學(xué)材料摻雜改性,在制造非線性光學(xué)元器件,如光波導(dǎo),光開關(guān)等有獨(dú)特優(yōu)勢。金屬離子注入玻璃材料是其中常見應(yīng)用,加工中會(huì)在玻璃材料約幾百納米深度內(nèi)產(chǎn)生納米粒子,這些納米粒子在光場激發(fā)下會(huì)產(chǎn)生等離子體共振效應(yīng),從而形成特定的光學(xué)效應(yīng)。但是離子注入過程中,由于高速離子對目標(biāo)材料的撞擊作用,會(huì)不可避免地產(chǎn)生結(jié)構(gòu)缺陷,這將影響材料的光,電學(xué)以及機(jī)械性能,在很多應(yīng)用中,需要材料中的結(jié)構(gòu)均一完整,此時(shí)結(jié)構(gòu)缺陷需要被修復(fù)。傳統(tǒng)的加熱退火及納秒修復(fù)存在裝置復(fù)雜且不具有選擇性修復(fù)能力的問題,為此我們基于飛秒激光超短脈沖與超高能量密度特點(diǎn)產(chǎn)生的非線性吸收效應(yīng),提出利用飛秒激光修復(fù)玻璃材料中缺陷的新型加工方法。本文主要包含以下工作:(1)利用SRIM(Stopping and Range of Ions in Matter)軟件模擬離子注入過程,包括:a)注入離子和缺陷在材料中的2維分布圖像;b)注入離子導(dǎo)致反沖原子的分布情況;c)注入離子能量在材料中的分配。計(jì)算結(jié)果揭示了離子注入引發(fā)的缺陷類型和特征。(2)搭建飛秒激光修復(fù)樣品缺陷的實(shí)驗(yàn)平臺。光源為脈寬35fs,中心波長800nm的飛秒激光器。光路中使用多種光電學(xué)元器件實(shí)現(xiàn)能量的精確控制。樣品固定在三維位移臺上。位移臺可以實(shí)現(xiàn)高空間分辨率的運(yùn)動(dòng)。對位移臺進(jìn)行了二次編程以滿足特定實(shí)驗(yàn)要求。(3)進(jìn)行飛秒激光修復(fù)樣品缺陷實(shí)驗(yàn)。通過一系列表征手段分析了材料的光學(xué)性質(zhì)和襯底結(jié)構(gòu)以及表面形貌,包括通過紫外-可見光分光光度計(jì)測量了光吸收譜,通過拉曼共聚焦顯微鏡測量襯底網(wǎng)絡(luò)特征,利用原子力顯微鏡測量材料表面形貌。我們通過一系列實(shí)驗(yàn),顯示當(dāng)能量控制在合適范圍內(nèi),襯底原子可以得到合適能量,回到原位修復(fù)缺陷,且不發(fā)生燒蝕。該新方法中,材料不發(fā)生熔融和燒蝕過程,也無需激光與離子束共同照射,具有高空間分辨,高效性和便利性,在非線性光學(xué)元器件的制造中有良好的應(yīng)用前景。
[Abstract]:Ion implantation has been widely used in doping and modification of optical materials, and has unique advantages in making nonlinear optical components, such as optical waveguides, optical switches, etc. Metal ion implantation glass material is one of the common applications. Nanocrystalline particles are produced in glass at a depth of about hundreds of nanometers, which produce plasmon resonance effects under light field excitation, resulting in specific optical effects. But during ion implantation, Due to the impact of high velocity ions on the target material, structural defects will inevitably occur, which will affect the optical, electrical and mechanical properties of the material. In many applications, the structure of the material needs to be uniform and complete. Traditional heating annealing and nanosecond repair have complex devices and do not have selective repair capability. Therefore, we based on the nonlinear absorption effect of femtosecond laser ultrashort pulse and ultra-high energy density. A new processing method for repairing defects in glass material by femtosecond laser is proposed. This paper mainly includes the following work: 1) simulating the process of ion implantation by using SRIM(Stopping and Range of Ions in matter software. The distribution of recoil atoms caused by ion implantation in the material. The distribution of ion energy in the material. The calculated results reveal the type of defect initiated by ion implantation. Femtosecond laser is used to repair defects in samples. The light source is a femtosecond laser with a pulse width of 35fs and a center wavelength of 800nm. In the optical path, a variety of optoelectronic components are used to accurately control the energy. The sample is fixed in three dimensions. Displacement table. Displacement table can realize motion with high spatial resolution. Second programming of displacement table is carried out to meet specific experimental requirements. Femtosecond laser repair experiment of sample defects is carried out. A series of characterization methods are used to analyze the results. The optical properties, substrate structure and surface morphology of the material, This includes measuring the absorption spectrum by UV-Vis spectrophotometer, measuring the substrate network characteristics by Raman confocal microscopy, and measuring the surface morphology of the material by atomic force microscope. It is shown that when the energy is controlled within a suitable range, the substrate atom can obtain the appropriate energy and return to the in-situ repair of defects without ablation. In this new method, the material does not undergo melting and ablation, and there is no need for laser and ion beam irradiation. With high spatial resolution, high efficiency and convenience, it has a good application prospect in the manufacture of nonlinear optical components.
【學(xué)位授予單位】：北京理工大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TQ171.65;TN249

【參考文獻(xiàn)】

相關(guān)期刊論文 前3條

1 宮斌;張冶文;鄭飛虎;肖春;吳長順;;無機(jī)粉末摻雜對低密度聚乙烯中空間電荷分布及陷阱能級的影響[J];材料科學(xué)與工程學(xué)報(bào);2006年01期

2 楊淼,司金海,王玉曉,李淳飛;基于激發(fā)態(tài)非線性折射效應(yīng)的全光開關(guān)與光限幅[J];物理學(xué)報(bào);1995年03期

3 朱祥正,張薈星,張孝吉;金屬蒸氣真空孤離子源及其束流密度分布[J];微細(xì)加工技術(shù);1990年04期

，

本文編號：1667742