【摘要】：高離化率物理氣相沉積是一種新發(fā)展起來的脈沖磁控濺射技術(HPPMS),具有濺射靶材原子高度離化與峰值功率超過平均功率等特點。它作為一種新型的離子化物理氣相沉積技術,在國內外已經(jīng)成為一個研究熱點,其離子體特性、涂層工藝、高功率脈沖放電等備受國內外學者關注。沉積過程中,離子隨著電子碰撞與電荷交換發(fā)生電離,并按照雙極性擴散理論進行傳遞。在不同工作氣壓條件下,離子能量分布表現(xiàn)出不同的特點。在放電過程中使用高的峰值功率脈沖(超出一般沉積技術2~3個數(shù)量級)與低脈沖占空比(0.5%~10%)實現(xiàn)高電離(50%),從而表現(xiàn)出了優(yōu)良的結合力,在控制涂層結構與降低涂層的內部壓力等方面有相當大的優(yōu)勢。從HPPMS技術制備涂層的應用現(xiàn)狀出發(fā),介紹了高離化率物理氣相沉積涂層的特點、優(yōu)勢以及在制備復合涂層和涂層界面優(yōu)化等方面的研究進展。探討了高離化率物理氣相沉積涂層的未來發(fā)展趨勢,對涂層的應用效果進行了分析。
[Abstract]:High ionization rate physical vapor deposition (PVD) is a newly developed pulsed magnetron sputtering technique (HPPMS),) with the characteristics of high atomic ionization and peak power exceeding average power. As a new type of ionization physical vapor deposition technology, it has become a research hotspot at home and abroad. In the deposition process, the ions ionize with electron collision and charge exchange and transfer according to the theory of bipolar diffusion. The ion energy distribution shows different characteristics under different working pressure. In the discharge process, high ionization (50%) is achieved by using high peak power pulse (2 ~ 3 orders of magnitude higher than conventional deposition technique) and low pulse duty cycle (0.510%). It has great advantages in controlling the coating structure and reducing the internal pressure of the coating. Based on the application of HPPMS technology in the preparation of coatings, the characteristics and advantages of high ionization rate physical vapor deposition coatings, as well as the research progress in the preparation of composite coatings and the optimization of coating interface are introduced. The future development trend of high ionization rate physical vapor deposition coatings was discussed and the application effect of the coatings was analyzed.
【作者單位】： 重慶交通大學機電與車輛工程學院;
【分類號】：TB306

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