多級(jí)結(jié)構(gòu)水滑石薄膜電容器正負(fù)極的構(gòu)筑及性能研究
發(fā)布時(shí)間:2018-07-03 15:56
本文選題:水滑石復(fù)合物 + 碳納米管。 參考:《北京化工大學(xué)》2015年碩士論文
【摘要】:贗電容的性能依賴于多級(jí)結(jié)構(gòu)的構(gòu)筑和復(fù)合。通過(guò)在泡沫鎳基體的表面原位生長(zhǎng)NiAl水滑石薄膜,之后直接采用氣相沉積法(CVD)在水滑石薄膜表面原位生長(zhǎng)多壁碳納米管薄膜,最后在碳納米管薄膜的表面再次原位生長(zhǎng)NiAl水滑石薄膜,獲得了三維鎳鋁水滑石/多壁碳納米管/泡沫鎳(NiAl-LDH/MWCNT/NF)多級(jí)結(jié)構(gòu)薄膜。第一步,采用溶膠凝膠法,泡沫鎳提供鎳源,鋁溶膠提供鋁源,使用氨水調(diào)節(jié)pH值,在泡沫鎳的表面原位生長(zhǎng)鎳鋁水滑石薄膜(NiAl-LDH/NF),第二步,采用上一步制備的薄膜做基體和催化劑,乙炔氣體提供碳源,通過(guò)化學(xué)氣相沉積法(CVD)在泡沫鎳表面原位生長(zhǎng)多壁碳納米管薄膜(MWCNT/NF)。第三步,采用尿素水熱分解法,硝酸鎳,硝酸鋁的混合溶液提供鎳源和鋁源,加入適量的十二烷基硫酸鈉(SDS),在MWCNT/NF的表面原位生長(zhǎng)鎳鋁水滑石。最終獲得了多級(jí)結(jié)構(gòu)的薄膜。采用XRD, SEM, ICP, RAMAN等測(cè)試結(jié)果表明,在MWCNT/NF表面獲得了均勻致密的鎳鋁水滑石薄膜;钚晕镔|(zhì)(NiAl-LDH)負(fù)載量為5.8 mg cm-2。電化學(xué)性能測(cè)試結(jié)果表明該電極的面積比電容值約為7.5 F cm-2,換算為質(zhì)量比電容為1293 F g-1,在30 mA cm-1電流密度下,充放電1000個(gè)循環(huán)后,其循環(huán)穩(wěn)定性達(dá)83%。與第一步制備NiAl-LDH/NF薄膜電極(面積比電容5.6 F cm-2,質(zhì)量比電容938Fg-1和69%的循環(huán)穩(wěn)定性)相比,電化學(xué)性能明顯提高。說(shuō)明這種將碳納米管生長(zhǎng)在導(dǎo)電基體,再原位生長(zhǎng)鎳鋁水滑石薄膜的多級(jí)結(jié)構(gòu)構(gòu)筑方式,提高了電極的比表面積和電導(dǎo)率,進(jìn)而提高了其贗電容性能。采用共沉淀法,以FeS04和Fe2(S04)3提供鐵源,氫氧化鈉作為沉淀劑,添加多壁碳納米管,制備了FeⅡFeⅢ-LDH/MWCNT復(fù)合電極,XRD、SEM等測(cè)試結(jié)果表明FeⅡFeⅢ-LDH成功復(fù)合到MWCNT的表面。電化學(xué)性能測(cè)試表明,在電流密度1 A g-1時(shí),FeⅡFeⅢ-LDH和FeⅡFeⅢ-LDH/MWCNT的質(zhì)量比電容分別為461 F g-1和980 F g-1,說(shuō)明將FeⅡFeⅢ-LDH直接復(fù)合在MWCNT的表面,增加了FeⅡFeⅢ-LDH導(dǎo)電性,暴露出了更多的電化學(xué)活性位點(diǎn),提高了FeⅡFeⅢ-LDH的贗電容性能。該方法構(gòu)筑的多級(jí)結(jié)構(gòu)NiAl-LDH/MWCNT/NF和FeⅡFeⅢ-LDH/MWCNT電極材料在電化學(xué)儲(chǔ)能方面有著潛在的應(yīng)用價(jià)值。
[Abstract]:The performance of pseudo-capacitance depends on the construction and composition of multilevel structure. Nial hydrotalcite films were grown on the surface of nickel foams in situ, and then multiwalled carbon nanotube films were directly grown on the surface of hydrotalcite films by vapor deposition (CVD). Finally, nial hydrotalcite thin films were grown in situ on the surface of carbon nanotube films, and three dimensional Ni-Al hydrotalcite / multi-wall carbon nanotubes / foamed nickel (NiAl-LDH / MWCNT / NF) multilevel structure films were obtained. In the first step, Ni-Al hydrotalcite film (NiAl-LDH / NF) was grown in situ on the surface of nickel foam by sol-gel method, nickel source was provided by foamed nickel, aluminum sol provided aluminum source, pH value was adjusted by ammonia water, and NiAl-LDH / NF film was grown on the surface of foamed nickel in situ. Multiwalled carbon nanotubes (MWCNT / NF) films were grown on the surface of nickel foam by chemical vapor deposition (CVD), using the films prepared by the previous step as the substrate and catalyst, and the carbon source was provided by acetylene gas. In the third step, nickel-aluminum hydrotalcite was grown in situ on the surface of MWCNT / NF by urea hydrothermal decomposition, nickel and aluminum sources were provided by mixed solution of nickel nitrate and aluminum nitrate, and appropriate amount of sodium dodecyl sulfate (SDS) was added. Finally, multilevel structure films were obtained. The results of XRD, SEM, ICP and Raman measurements show that uniform and dense Ni-Al hydrotalcite films were obtained on the surface of MWCNT / NF. The loading amount of the active substance (NiAl-LDH) was 5.8 mg cm-2. The electrochemical performance test results show that the area specific capacitance of the electrode is about 7.5F cm-2, which is converted to the mass specific capacitance of 1293 F g -1. At 30 Ma cm-1 current density, after charging and discharging 1000 cycles, the cyclic stability of the electrode reaches 83%. Compared with the first step, the electrochemical performance of NiAl-LDH / NF thin film electrode (area specific capacitance 5.6 F cm-2, mass specific capacitance 938 Fg-1 and 69% cycle stability) was significantly improved. The results show that the multistage structure of nickel aluminum hydrotalcite films grown on conductive substrates and in situ by carbon nanotubes can improve the specific surface area and conductivity of the electrodes and further improve their pseudo-capacitance properties. Fe 鈪,
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