本文選題：磁控濺射　切入點(diǎn)：復(fù)合脈沖　出處：《哈爾濱工業(yè)大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：高功率磁控濺射技術(shù)是一種優(yōu)質(zhì)的鍍膜方法,具有離化率高、瞬時(shí)功率大以及膜層性能良好等優(yōu)點(diǎn),受到科研及工業(yè)領(lǐng)域的廣泛關(guān)注。然而由于高功率磁控濺射平均功率小,膜層沉積速率低,在工業(yè)應(yīng)用中受到了限制。針對(duì)高功率磁控濺射沉積速率低的問題,本文提出了一種復(fù)合脈沖磁控濺射新方法,該方法采取兩路脈沖耦合的方式,使用電壓高脈寬小的引燃脈沖離化氣體,電壓低脈寬長(zhǎng)的工作脈沖維持等離子體放電,從而在獲得高密度等離子體的同時(shí),維持較高的平均功率。使用Particle-in-Cell/Monte Carlo模型對(duì)復(fù)合脈沖放電過程進(jìn)行數(shù)值仿真,研究放電過程等離子體動(dòng)力學(xué)及放電波形形成機(jī)制。結(jié)果表明,等離子體分布受到空間電磁場(chǎng)的共同作用,空間等離子體的不均勻分布又會(huì)對(duì)空間電場(chǎng)造成影響。在磁控濺射放電過程中,空間電勢(shì)逐漸升高,出現(xiàn)電勢(shì)梯度較大的陰極鞘層區(qū)域和等離子體濃度較大的離化區(qū)域。靶材電壓越高,離化氣體能力越強(qiáng),產(chǎn)生等離子體數(shù)目越多,離子能量越高,靶材電流也越大。對(duì)于復(fù)合脈沖,空間電勢(shì)與等離子體濃度分布于單脈沖相似,引燃脈沖關(guān)斷后一段時(shí)間內(nèi)工作脈沖能夠有效維持較高的等離子體濃度和電流密度,而空間離子能量則會(huì)隨著電壓的降低而降低。使用FPGA作為核心控制器,觸摸屏作為人機(jī)交互,研制了復(fù)合脈沖電源。兩路脈沖電壓、脈寬和頻率可獨(dú)立調(diào)節(jié),相對(duì)相位關(guān)系可靈活設(shè)定,并具備過流保護(hù)降電壓的功能,保護(hù)電源在真空室安全工作,具有參數(shù)設(shè)定靈活、操作界面友好的特點(diǎn)。使用水負(fù)載對(duì)電源功能進(jìn)行測(cè)試,設(shè)定不同脈沖參數(shù),采集電壓電流波形,驗(yàn)證電源不同波形的實(shí)現(xiàn),并獲得電源電壓電流輸出特性。結(jié)果表明水負(fù)載中,電流和電壓成正比例對(duì)應(yīng)關(guān)系。對(duì)復(fù)合脈沖電源在真空室使用Cr靶進(jìn)行放電測(cè)試,與水負(fù)載中電流電壓線性相關(guān)不同,由于真空室內(nèi)等離子體負(fù)載非線性的特征,電流波形較為復(fù)雜。當(dāng)電壓為方波時(shí),電流波形接近三角形或扇形。對(duì)于復(fù)合脈沖,在引燃脈沖階段電流迅速上升,峰值電流與電壓和脈寬相關(guān),引燃脈沖關(guān)斷后電流下降,下降速率與工作脈沖電壓相關(guān)。結(jié)果表明,使用復(fù)合脈沖模式,在引燃脈沖階段能夠獲得較高峰值電流,在工作脈沖階段維持放電電流,與單脈沖相比平均電流明顯提高。
[Abstract]:High power magnetron sputtering is a kind of high quality coating method, which has many advantages such as high ionization rate, high instantaneous power and good coating performance, and has attracted wide attention in scientific research and industry. However, the average power of high power magnetron sputtering is small. The deposition rate of film is low, which is limited in industrial application. In order to solve the problem of low deposition rate of high power magnetron sputtering, a new method of composite pulse magnetron sputtering is proposed in this paper, in which two pulses are coupled. The plasma discharge is maintained by using the ionization gas with high voltage and small pulse width, and the working pulse with low voltage and low pulse width, so that the high density plasma can be obtained at the same time. To maintain high average power, the Particle-in-Cell/Monte Carlo model is used to simulate the discharge process of composite pulse, and the plasma dynamics and the formation mechanism of discharge waveform are studied. The results show that, The plasma distribution is affected by the space electromagnetic field, and the non-uniform distribution of the space plasma will affect the space electric field. During the discharge of magnetron sputtering, the space potential increases gradually. The higher the voltage of the target, the stronger the ability of ionizing gas, the more the number of plasma, the higher the ion energy. The larger the target current is, for the composite pulse, the spatial potential is similar to the plasma concentration, and the working pulse can maintain the high plasma concentration and current density effectively within a period of time after the ignition pulse is off. Using FPGA as core controller and touch screen as man-machine interaction, a compound pulse power supply is developed. Two pulse voltages, pulse width and frequency can be adjusted independently. The relative phase relation can be set flexibly and has the function of overcurrent protection and voltage drop. The protection power supply works safely in the vacuum chamber. It has the characteristics of flexible parameter setting and friendly operation interface. The function of power supply is tested by water load. Setting different pulse parameters, collecting voltage and current waveforms, verifying the realization of different waveforms of power supply, and obtaining the output characteristics of power supply voltage and current. The discharge test of composite pulse power supply using Cr target in vacuum chamber is different from the linear correlation between current and voltage in water load. Because of the nonlinear characteristics of plasma load in vacuum chamber, the current and voltage are proportional to each other. The current waveform is complex. When the voltage is square wave, the current waveform is close to triangle or sector. For the compound pulse, the current increases rapidly in the ignition pulse, the peak current is related to the voltage and pulse width, and the current decreases after the ignition pulse is off. The results show that the peak current can be obtained in the ignition pulse phase and the discharge current is maintained at the working pulse stage, and the average current is significantly higher than that of the single pulse.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TB306

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