UV-LIGA工藝誤差對(duì)MEMS萬(wàn)向慣性開(kāi)關(guān)性能的影響
發(fā)布時(shí)間:2019-02-13 17:12
【摘要】:為提高微機(jī)電系統(tǒng)(MEMS)萬(wàn)向慣性開(kāi)關(guān)的性能,實(shí)現(xiàn)工程化應(yīng)用,對(duì)其進(jìn)行工藝誤差與性能關(guān)系研究.基于多層UV-LIGA工藝制作多個(gè)開(kāi)關(guān)樣機(jī),進(jìn)行主要結(jié)構(gòu)尺寸測(cè)量,并確定工藝誤差方向;從UV-LIGA工藝過(guò)程的曝光、顯影與電鑄、腐蝕3個(gè)階段,分析誤差的產(chǎn)生機(jī)理,并進(jìn)一步分析單一結(jié)構(gòu)誤差、非對(duì)稱(chēng)誤差和偏心誤差對(duì)開(kāi)關(guān)閾值和接觸時(shí)間的影響.結(jié)果表明:彈簧線寬、厚度、側(cè)壁傾角和兩電極間隙等單一結(jié)構(gòu)尺寸的增大會(huì)導(dǎo)致閾值增大;非對(duì)稱(chēng)誤差會(huì)導(dǎo)致開(kāi)關(guān)各向剛度不一致,使閾值散布更大;偏心誤差會(huì)大幅度減小開(kāi)關(guān)軸向閾值,而對(duì)徑向閾值影響較小.對(duì)多個(gè)開(kāi)關(guān)樣機(jī)的測(cè)試結(jié)果驗(yàn)證了開(kāi)關(guān)工藝誤差及單一結(jié)構(gòu)誤差對(duì)閾值影響的正確性.
[Abstract]:In order to improve the performance of (MEMS) universal inertial switch and realize its engineering application, the relationship between process error and performance is studied. Based on the multi-layer UV-LIGA process, several switch prototypes are made to measure the main structure dimensions and determine the error direction of the process. From the three stages of exposure, development and electroforming, corrosion of UV-LIGA process, the mechanism of error is analyzed, and the effects of single structure error, asymmetric error and eccentric error on the threshold value and contact time of switch are further analyzed. The results show that the threshold value will increase with the increase of spring width, thickness, side wall inclination angle and gap between two electrodes, and the asymmetry error will lead to the inconsistency of the stiffness of each direction of the switch, which will make the threshold dispersion larger. The eccentric error will greatly reduce the axial threshold of the switch, but have little effect on the radial threshold. The experimental results of several prototypes of switches verify the correctness of the effect of switching process error and single structure error on the threshold value.
【作者單位】: 南京理工大學(xué)機(jī)械工程學(xué)院;
【基金】:國(guó)家自然科學(xué)基金資助項(xiàng)目(51475245)
【分類(lèi)號(hào)】:TH-39
本文編號(hào):2421768
[Abstract]:In order to improve the performance of (MEMS) universal inertial switch and realize its engineering application, the relationship between process error and performance is studied. Based on the multi-layer UV-LIGA process, several switch prototypes are made to measure the main structure dimensions and determine the error direction of the process. From the three stages of exposure, development and electroforming, corrosion of UV-LIGA process, the mechanism of error is analyzed, and the effects of single structure error, asymmetric error and eccentric error on the threshold value and contact time of switch are further analyzed. The results show that the threshold value will increase with the increase of spring width, thickness, side wall inclination angle and gap between two electrodes, and the asymmetry error will lead to the inconsistency of the stiffness of each direction of the switch, which will make the threshold dispersion larger. The eccentric error will greatly reduce the axial threshold of the switch, but have little effect on the radial threshold. The experimental results of several prototypes of switches verify the correctness of the effect of switching process error and single structure error on the threshold value.
【作者單位】: 南京理工大學(xué)機(jī)械工程學(xué)院;
【基金】:國(guó)家自然科學(xué)基金資助項(xiàng)目(51475245)
【分類(lèi)號(hào)】:TH-39
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